A Dry-Contact Ear-EEG System With Continuous Electrode-Skin Impedance Mismatch Monitoring for Motion Artifact Cancellation Using DRL Stimulus
Abstract
Dry-contact ear-electroencephalography (Ear-EEG) enables wearable neural monitoring. However, motion induced electrode-skin impedance (ESI) mismatches between electrodes can severely degrade signal quality. To the best of our knowledge, this paper presents the first proof-of-concept dry-contact EarEEG system that uses a driven-right-leg (DRL) stimulus for continuous ESI mismatch monitoring, enabling online adaptive motion artifact cancellation. A 1 kHz sinusoidal stimulus is injected through the...
Description / Details
Dry-contact ear-electroencephalography (Ear-EEG) enables wearable neural monitoring. However, motion induced electrode-skin impedance (ESI) mismatches between electrodes can severely degrade signal quality. To the best of our knowledge, this paper presents the first proof-of-concept dry-contact EarEEG system that uses a driven-right-leg (DRL) stimulus for continuous ESI mismatch monitoring, enabling online adaptive motion artifact cancellation. A 1 kHz sinusoidal stimulus is injected through the DRL electrode. The resulting response to the injected carrier is separated from the EEG using bandpass filtering and demodulation, and then used to extract the ESI mismatch information as the reference input for a normalized least-mean-square adaptive filter followed by a Hampel filtering stage. To evaluate artifact suppression and preservation of neural activity, alpha-band EEG activity was analyzed involving four healthy participants performing head nodding, electrode tapping, and jaw clenching. The system achieved artifact power reductions of 6.5, 12.6, and 9.0 dB (77.6%, 92.8%, and 86.4%, respectively) while alpha-band modulation remained clearly observable after processing. This demonstrates the feasibility of DRL-stimulusbased ESI mismatch monitoring for motion artifact cancellation in wearable dry-contact Ear-EEG.
Source: arXiv:2609.02777v1 - http://arxiv.org/abs/2609.02777v1 PDF: https://arxiv.org/pdf/2609.02777v1 Original Link: http://arxiv.org/abs/2609.02777v1
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Sep 3, 2026
Chemical Engineering
Engineering
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